Exhibition Dates: 31 January - 02-February 2017
Location: San Francisco, California, United States
Booth Number: 1036
- August 2016: Completion of BAM’s MWIR/LWIR coater is on track for completion in November 2016.
- July 2016: The new Roll to Roll coater is online undergoing process characterization.
- July 2016: Electrolytic and electroless plating processes added to compliment thin film coatings
- June 2016: BAM breaks ground on new photolithography lab. The addition of adding photolithographic patterning capabilities will enhance BAM’s toolbox to support the microelectronic industry specifically for RF substrates, Peltier devices, thermal backplanes, and hermetic metallization. The new lab will be completed by December 2016.
- April 2016: BAM’s large area hybrid optical coating system is nearing the final phase of construction, the chamber will have the ability to optically coat 48 – 200mm wafers per run.